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Derniers dépôts
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Glenn Otakandza Kandjani, Pascal Brault, Maxime Mikikian, Armelle Michau, Khaled Hassouni. Molecular dynamics simulation of the interaction of an Ar/CH 4 plasma with a surface: Growth, structure, and sputtering of the deposited C:H films. Plasma Processes and Polymers, 2024, 21 (8), pp.e2400084. ⟨10.1002/ppap.202400084⟩. ⟨hal-04789335⟩
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Lakshman Srinivasan, Laurent Invernizzi, Swaminathan Prasanna, Kristaq Gazeli, Nicolas Fagnon, et al.. Nitrogen atoms absolute density measurement using two-photon absorption laser induced fluorescence in reactive magnetron discharge for gallium nitride deposition. Applied Physics Letters, 2024, 124 (10), ⟨10.1063/5.0192748⟩. ⟨hal-04778281⟩